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Grafting Processes |
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Materials investigated |
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Grafting kinetics |
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Water
contact angle |
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Grafting Telechelics from a
Polymer Matrix (Melt) |
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AFM images of the
30%polymer/70% oligomer system |
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Adsorption of the
matrix polymer as a function of time |
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Materials investigated |
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These materials are
commercially available from Aldrich. |
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Grafting kinetics |
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Grafting kinetics for
Poly(Bisphenol A-co-epichlorohydrin) glydiyl end-capped telechelics
were studied.
Initial studies were conducted with Poly(Bisphenol A-co-epichlorohydrin)
with a range of number average molecular weights (Mn) from 1075 to
6100. It is expected that MW will have a profound effect on the
number of multiply-bound polymer chains grafted to the substrate.
Preliminary results show an unexpected trend in the reaction
kinetics for the series of epoxy-functionalized polymers.
Films were prepared by spin-casting the telechelic polymers from a
10% (wt/wt) THF solution onto hydroxylated silicon substrates.
Thickness of the spin-cast film varied between 250-300 nm depending
on the MW of the polymer. Films were annealed at 150 ˚C and removed
at prescribed time intervals in order to follow the kinetics of the
reaction.
Picture below shows
that the processes of polymer grafting to the substrate can be
segmented into two main regimes. During the first regime, deposition
of the graft polymer is limited by the classical diffusion of the
polymer chains to the interface.
In this case, the grafting process is carried out from the melt so
many chains are not limited by diffusion and must only undergo a
reorientation within the first several mono-layers to expose the
terminal functionalities to the reactive substrate.
It is believed that this phenomenon extends the duration of the fast
portion of the grafting kinetics leading to a more efficient
anchoring process. This process is relatively fast leading to the
formation of a polymer layer through which additional polymer chains
must diffuse in order to reaction with the substrate. The formation
of this polymer layer presents additional polymer chains being
grafted with a potential barrier that has to be overcome to reach
the surface reactive functionalities.
This is characteristic of the second, slower regime of the grafting
process.
The results seem to follow the classical description for the two
regimes of the grafting process. The grafting process plateaus for
these systems around 300 min with no significant changes in
thickness observed after 6 hours of grafting time.
The most notable aspect of the results shown is the variation in the
final thickness of the grafted polymer films. The lowest MW (1075)
telechelic yield the lowest film thickness (3.8 nm) which is what
one would expect. However, the variation in the final thickness of
the remaining polymers films is unexpected. The second lowest MW
(1750) yield the greatest final thickness of about 5.8 nm. The two
highest MW ,4000 and 6100, give an intermediate film thickness of
5.2 and 4.5 nm, respectively. This could imply that the lower MW
telechelics adopt a brush-like confirmation at high grafting
densities while the larger MW telechelic preferentially form loops
on the substrate yielding a thinner grafted polymer film.
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Water contact angle |
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Picture below shows
the water contact angle measurements for two of the films
from the previous experiment.
Water contact angles (static) for the 1075 and 4000 MW telechelic
are relatively indistinguishable with values of 74˚ and 76˚,
respectively after 6 hours of grafting time. These values are much
greater than that reported in literature for an epoxy end-capped
monolayer with a water contact angle of 52˚. |
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Grafting Telechelics from a Polymer
Matrix (Melt) |
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We also investigated
the grafting process of the same telechelics in the melt from a
polymer matrix. Sample preparation was similar to that previously
mentioned with a few changes. The substrate used in the following
experiments was an aminopropyltrimethoxysilane functionalized
silicon substrate. The thickness of the APS layer was consistent
with 1 – 3 layers of the silane. The polymer/telechelic mixture was
spin-casted onto the APS-modified substrate from a 2%
(wt/wt) THF solution with varying ratios of polymer to telechelic.
Samples were annealed in a vacuum oven at 150 ˚C for a prescribed
amount of time. Picture below shows the kinetics for the various
systems under investigation. |
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AFM images of the 30%polymer/70%
oligomer system |
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AFM images of the
films compliment the increase in thickness by showing an increase in
surface coverage as a function of time. |
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Adsorption of the matrix polymer as
a function of time |
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A
control experiment was also conducted under the same conditions
using the pure non-functionalized poly(bisphenol A-co-epichlorohydrin)
polymer. From this control experiment, it was found that the matrix
polymer undergoes an irreversible adsorption process under the
grafting conditions. As shown in picture below, the matrix polymer
thickness increases as a function of time. |
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